发明授权
- 专利标题: Method of making sub-surface photoalterations in a material
- 专利标题(中): 在材料中制作表面光刻法的方法
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申请号: US11942627申请日: 2007-11-19
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公开(公告)号: US08231612B2公开(公告)日: 2012-07-31
- 发明人: Ruben Zadoyan , Michael Karavitis , Ronald M. Kurtz
- 申请人: Ruben Zadoyan , Michael Karavitis , Ronald M. Kurtz
- 申请人地址: US CA Santa Ana
- 专利权人: AMO Development LLC.
- 当前专利权人: AMO Development LLC.
- 当前专利权人地址: US CA Santa Ana
- 代理机构: AMO Development LLC.
- 主分类号: A61B18/20
- IPC分类号: A61B18/20
摘要:
A method of photoaltering a material using a pulsed laser beam includes selecting a first pulse energy and a first focal point separation based on a relationship of pulse energy and focal point separation combinations enabling layer separation of the material by photoalteration, and scanning the pulsed laser beam along a scan region at the first pulse energy and the first focal point separation. The relationship has a slope and has a distinct change in the slope. The distinct change in the slope is associated with a second pulse energy of the relationships and the first pulse energy is equal to or less than the second pulse energy.
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