Invention Grant
- Patent Title: Semiconductor manufacturing apparatus and method for manufacturing a semiconductor
- Patent Title (中): 半导体制造装置及其制造方法
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Application No.: US12801420Application Date: 2010-06-08
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Publication No.: US08232216B2Publication Date: 2012-07-31
- Inventor: Hiroyuki Baba , Tomoyasu Kai
- Applicant: Hiroyuki Baba , Tomoyasu Kai
- Applicant Address: JP Tokyo
- Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Rabin & Berdo, P.C.
- Priority: JP2009-144813 20090618
- Main IPC: H01L21/31
- IPC: H01L21/31 ; C23C16/00

Abstract:
Provided are a semiconductor manufacturing apparatus and method, capable of reliably and rapidly transporting a heated semiconductor wafer. the apparatus is provided for transporting a semiconductor wafer, which has been processed by desired treatment (for example, film formation) and is held by a susceptor equipped with a heater, to the outside by a transport arm which holds the semiconductor wafer by suction, by moving the susceptor to a certain position above a top of a wafer waiting stage and introducing the semiconductor wafer held by the susceptor onto the top of the wafer waiting stage. Then, the susceptor present on the top of the wafer waiting stage is moved in a horizontal direction. After a certain cooling time, the transport arm holds the semiconductor wafer placed on the wafer waiting stage by suction and transports the semiconductor wafer to outside.
Public/Granted literature
- US20100323528A1 Semiconductor manufacturing apparatus and method for manufacturing a semiconductor Public/Granted day:2010-12-23
Information query
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