发明授权
- 专利标题: Recast removal method
- 专利标题(中): 重磨去除方法
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申请号: US12138710申请日: 2008-06-13
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公开(公告)号: US08236190B2公开(公告)日: 2012-08-07
- 发明人: Michael J. Gehron , Henry M. Hodgens
- 申请人: Michael J. Gehron , Henry M. Hodgens
- 申请人地址: US CT Hartford
- 专利权人: United Technologies Corporation
- 当前专利权人: United Technologies Corporation
- 当前专利权人地址: US CT Hartford
- 代理机构: Carlson, Gaskey & Olds, P.C.
- 主分类号: C03C15/00
- IPC分类号: C03C15/00 ; C03C25/68 ; C25F3/00
摘要:
A method of removing recast from a substrate is disclosed. The method includes chemically removing the recast using an etchant, which provides a visual indication of the presence of the recast when the part has been removed from the etchant. One example chemical etchant is comprised of a sulfuric acid solution that includes sodium chloride, sodium fluoride and ammonium persulfate. After chemical removal of the recast from the substrate, the recast is physically removed from the substrate, for example, by media blasting. The chemical and physical recast removal process can be repeated as desired. To ensure that all the recast has been removed, the substrate is wiped, for example, using a cloth. If all the recast has been removed, the cloth will not change in appearance or color.
公开/授权文献
- US20090308761A1 RECAST REMOVAL METHOD 公开/授权日:2009-12-17
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