发明授权
- 专利标题: Method of manufacturing a magneto-resistive device
- 专利标题(中): 制造磁阻元件的方法
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申请号: US12232785申请日: 2008-09-24
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公开(公告)号: US08240026B2公开(公告)日: 2012-08-14
- 发明人: Takeo Kagami , Tetsuya Kuwashima , Norio Takahashi
- 申请人: Takeo Kagami , Tetsuya Kuwashima , Norio Takahashi
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2003-006319 20030114; JP2003-415810 20031212
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; H04R31/00
摘要:
A method for manufacturing a magneto-resistive device. The magneto-resistive device is for reducing the deterioration in the characteristics of the device due to annealing. The magneto-resistive device has a magneto-resistive layer formed on one surface side of a base, and an insulating layer formed of two layers and deposited around the magneto-resistive layer. The layer of the insulating layer closest to the base is made of a metal or semiconductor oxide. This layer extends over end faces of a plurality of layers made of different materials from one another, which make up the magneto-resistive device, and is in contact with the end faces of the plurality of layers with the same materials.
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