发明授权
US08247317B2 Methods of solid phase recrystallization of thin film using pulse train annealing method 有权
使用脉冲串退火法对薄膜进行固相重结晶的方法

Methods of solid phase recrystallization of thin film using pulse train annealing method
摘要:
Embodiments of the present invention provide methods of solid phase recrystallization of thin film using a plurality of pulses of electromagnetic energy. In one embodiment, the methods of the present invention may be used to anneal an entire substrate surface or selected regions of a surface of a substrate by delivering a plurality of pluses of energy to a crystalline seed region or layer upon which an amorphous layer is deposited to recrystallize the amorphous layer so that it has the same grain structure and crystal orientation as that of the underlying crystalline seed region or layer.
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