发明授权
- 专利标题: Method for increasing oxytocin release in the epidermis
- 专利标题(中): 增加表皮中催产素释放的方法
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申请号: US12616908申请日: 2009-11-12
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公开(公告)号: US08247382B2公开(公告)日: 2012-08-21
- 发明人: Sumiko Denda , Mitsuhiro Denda , Kazuyuki Ikeyama
- 申请人: Sumiko Denda , Mitsuhiro Denda , Kazuyuki Ikeyama
- 申请人地址: JP Tokyo
- 专利权人: Shiseido Company, Ltd.
- 当前专利权人: Shiseido Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 主分类号: A01N43/04
- IPC分类号: A01N43/04 ; A61K31/70
摘要:
A method for increasing oxytocin release through direct action on the epidermal keratinocytes is provided. The method for increasing oxytocin release in the epidermis includes increasing the calcium ion concentration in the epidermal cells. In the method of the present invention, the increase of the calcium ion concentration in the epidermal cells may be achieved by physically stimulating the skin. The physical stimulation may be achieved by applying a heat stimulus and/or a massage. The increase of the calcium ion concentration in the epidermal cells may be achieved by stimulating the epidermal cells by at least one agent selected from the group consisting of ATP, UTP, 4 alpha-phorbol 12,13-didecanoate, and pharmaceutically acceptable salts thereof.
公开/授权文献
- US20100130438A1 METHOD FOR INCREASING OXYTOCIN RELEASE IN THE EPIDERMIS 公开/授权日:2010-05-27