发明授权
- 专利标题: Conductive substrate structure with conductive channels formed by using a two-sided cut approach and a method for manufacturing the same
- 专利标题(中): 具有通过使用双面切割方法形成的导电通道的导电基板结构及其制造方法
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申请号: US12649824申请日: 2009-12-30
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公开(公告)号: US08263876B2公开(公告)日: 2012-09-11
- 发明人: Bily Wang , Sung-Yi Hsiao , Jack Chen
- 申请人: Bily Wang , Sung-Yi Hsiao , Jack Chen
- 申请人地址: TW Hsinchu
- 专利权人: Harvatek Corporation
- 当前专利权人: Harvatek Corporation
- 当前专利权人地址: TW Hsinchu
- 代理机构: Rosenberg, Klein & Lee
- 主分类号: H05K1/11
- IPC分类号: H05K1/11
摘要:
A conductive substrate structure includes a substrate unit, a conductive pad unit, and a conductive layer unit. The substrate unit has a top surface, a bottom surface, two opposite lateral surfaces, and a front surface. The conductive pad unit has at least two first conductive pads separated from each other and disposed on the top surface, and at least two second conductive pads separated from each other and disposed on the bottom surface. The conductive layer unit has at least two first conductive layers formed on the front surface and respectively electrically connected to two front sides of the two first conductive pads, and at least two second conductive layers respectively formed on the two opposite lateral surfaces and respectively electrically connected to two opposite lateral sides of the two second conductive pads. The two first conductive layers are respectively electrically connected with the two second conductive layers.
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