Invention Grant
- Patent Title: Inspection apparatus
- Patent Title (中): 检验仪器
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Application No.: US13368764Application Date: 2012-02-08
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Publication No.: US08264679B2Publication Date: 2012-09-11
- Inventor: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
- Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-231640 20080910
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An inspection apparatus and method for detecting defects and haze on a surface of a sample includes illumination optics which emit light to illuminate an inspection region on the surface of the sample from an oblique direction relative to the inspection region, first detection optics which detect first scattered light from the inspection region and having a beam analyzer through an optical path, second detection optics which detect second scattered light from the inspection region, the second scattered light being scattered from a direction different than a direction of the first scattered light, and a signal-processing unit which treats different processings for a first signal of the detected first scattered light and for a second signal of the detected second scattered light and detecting defects and haze on the surface of the sample on the basis of at least one of the first signal and the second signal.
Public/Granted literature
- US20120140211A1 Inspection Apparatus Public/Granted day:2012-06-07
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