发明授权
- 专利标题： Illumination system and filter system
- 专利标题（中）： 照明系统和过滤系统
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申请号： US12318291申请日： 2008-12-24
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公开(公告)号： US08269179B2公开(公告)日： 2012-09-18
- 发明人: Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
- 申请人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/72 ; G01J3/10
摘要：
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
公开/授权文献
- US20090115980A1 Illumination system and filter system 公开/授权日：2009-05-07