发明授权
- 专利标题: Hardmask composition and associated methods
- 专利标题(中): 硬掩模组成及相关方法
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申请号: US11984741申请日: 2007-11-21
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公开(公告)号: US08273519B2公开(公告)日: 2012-09-25
- 发明人: Mi Young Kim , Sang Kyun Kim , Sang Hak Lim , Sang Ran Koh , Hui Chan Yun , Do Hyeon Kim , Dong Seon Uh , Jong Seob Kim
- 申请人: Mi Young Kim , Sang Kyun Kim , Sang Hak Lim , Sang Ran Koh , Hui Chan Yun , Do Hyeon Kim , Dong Seon Uh , Jong Seob Kim
- 申请人地址: KR Gumi-si, Gyeongsangbuk-do
- 专利权人: Cheil Industries, Inc.
- 当前专利权人: Cheil Industries, Inc.
- 当前专利权人地址: KR Gumi-si, Gyeongsangbuk-do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2006-0115411 20061121
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; G03F7/038 ; G03F7/20 ; G03F7/30 ; G03F7/36
摘要:
A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y (A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
公开/授权文献
- US20080118875A1 Hardmask composition and associated methods 公开/授权日:2008-05-22
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