Invention Grant
US08274205B2 System and method for limiting arc effects in field emitter arrays
有权
用于限制场发射器阵列中的电弧效应的系统和方法
- Patent Title: System and method for limiting arc effects in field emitter arrays
- Patent Title (中): 用于限制场发射器阵列中的电弧效应的系统和方法
-
Application No.: US11567095Application Date: 2006-12-05
-
Publication No.: US08274205B2Publication Date: 2012-09-25
- Inventor: Colin R. Wilson , Ji-Ung Lee
- Applicant: Colin R. Wilson , Ji-Ung Lee
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Scott J. Asmus
- Main IPC: H01J1/02
- IPC: H01J1/02

Abstract:
The system and method provided herein for limiting the effects of arcing in field-type electron emitter arrays improves the robustness of such arrays. Field-type electron emitter arrays generally have a substrate, an insulator, and a gating electrode. By including a resistive substance in the gate of the emitter array, arcing events may be isolated to a single emitter such that the remaining emitters of an array can continue electron emission and/or the short circuit current of the arc can be limited.
Public/Granted literature
- US20080129177A1 SYSTEM AND METHOD FOR LIMITING ARC EFFECTS IN FIELD EMITTER ARRAYS Public/Granted day:2008-06-05
Information query