发明授权
US08274811B2 Assisting FGL oscillations with perpendicular anisotropy for MAMR
有权
为MAMR协助垂直各向异性的FGL振荡
- 专利标题: Assisting FGL oscillations with perpendicular anisotropy for MAMR
- 专利标题(中): 为MAMR协助垂直各向异性的FGL振荡
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申请号: US12927699申请日: 2010-11-22
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公开(公告)号: US08274811B2公开(公告)日: 2012-09-25
- 发明人: Kunliang Zhang , Min Li , Yuchen Zhou
- 申请人: Kunliang Zhang , Min Li , Yuchen Zhou
- 申请人地址: US CA Milpitas
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 当前专利权人地址: US CA Milpitas
- 代理机构: Saile Ackerman LLC
- 代理商 Stephen B. Ackerman
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; G11C11/15 ; G11C11/16 ; H01L43/12
摘要:
A spin transfer oscillator (STO) structure is disclosed that includes two assist layers with perpendicular magnetic anisotropy (PMA) to enable a field generation layer (FGL) to achieve an oscillation state at lower current density for MAMR applications. In one embodiment, the STO is formed between a main pole and write shield and the FGL has a synthetic anti-ferromagnetic structure. The STO configuration may be represented by seed layer/spin injection layer (SIL)/spacer/PMA layer 1/FGL/spacer/PMA layer 2/capping layer. The spacer may be Cu for giant magnetoresistive (GMR) devices or a metal oxide for tunneling magnetoresistive (TMR) devices. Alternatively, the FGL is a single ferromagnetic layer and the second PMA assist layer has a synthetic structure including two PMA layers with magnetic moment in opposite directions in a seed layer/SIL/spacer/PMA assist 1/FGL/spacer/PMA assist 2/capping layer configuration. SIL and PMA assist layers are laminates of (CoFe/Ni)x or the like.
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