Invention Grant
- Patent Title: Thin film transistor substrate and method of manufacturing the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US12496298Application Date: 2009-07-01
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Publication No.: US08278723B2Publication Date: 2012-10-02
- Inventor: Kyung-Wook Kim , Jong-Hwan Lee , Young-Woon Kho , Jae-Hyun Park
- Applicant: Kyung-Wook Kim , Jong-Hwan Lee , Young-Woon Kho , Jae-Hyun Park
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2008-0086890 20080903
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
A thin film transistor substrate capable of appropriately maintaining driving performance even when there is a difference between manufacturing processes and a method of manufacturing the same. The thin film transistor substrate includes: a gate electrode formed on an insulating substrate; a semiconductor layer formed on the gate electrode; and a plurality of thin film transistors each having a source electrode and a drain electrode that are formed on the gate electrode and the semiconductor layer so as to be spaced apart from each other. At least one of the plurality of thin film transistors is a dummy thin film transistor that does not have the semiconductor layer between the source electrode and the drain electrode.
Public/Granted literature
- US20100051952A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-03-04
Information query
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