Invention Grant
US08283102B2 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition
有权
光酸发生剂，共聚物，化学放大抗蚀剂组合物，以及使用化学放大抗蚀剂组合物形成图案的方法
- Patent Title: Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition
- Patent Title (中): 光酸发生剂，共聚物，化学放大抗蚀剂组合物，以及使用化学放大抗蚀剂组合物形成图案的方法
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Application No.: US12416988Application Date: 2009-04-02
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Publication No.: US08283102B2Publication Date: 2012-10-09
- Inventor: Jung Hoon Oh , Sang Jin Kim , Jin Ho Kim , Dae Hyeon Shin
- Applicant: Jung Hoon Oh , Sang Jin Kim , Jin Ho Kim , Dae Hyeon Shin
- Applicant Address: KR Seoul
- Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee: Korea Kumho Petrochemical Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Ladas & Parry LLP
- Priority: KR10-2008-0122403 20081204
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C08F10/00 ; C07C69/773
Abstract:
Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.
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