发明授权
- 专利标题: Liquid crystal display device and method for manufacturing the same
- 专利标题(中): 液晶显示装置及其制造方法
-
申请号: US13101766申请日: 2011-05-05
-
公开(公告)号: US08283216B2公开(公告)日: 2012-10-09
- 发明人: Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
- 申请人: Shunpei Yamazaki , Shinji Maekawa , Gen Fujii , Hideaki Kuwabara
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权: JP2003-386023 20031114
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/84
摘要:
As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.
公开/授权文献
信息查询
IPC分类: