Invention Grant
US08288950B2 Apparatus and method for regulating the output of a plasma electron beam source
有权
用于调节等离子体电子束源的输出的装置和方法
- Patent Title: Apparatus and method for regulating the output of a plasma electron beam source
- Patent Title (中): 用于调节等离子体电子束源的输出的装置和方法
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Application No.: US12899012Application Date: 2010-10-06
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Publication No.: US08288950B2Publication Date: 2012-10-16
- Inventor: Scott G. Walton , Christopher D. Cothran , Richard F. Fernsler , Robert A. Meger , William E. Amatucci
- Applicant: Scott G. Walton , Christopher D. Cothran , Richard F. Fernsler , Robert A. Meger , William E. Amatucci
- Applicant Address: US DC Washington
- Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee Address: US DC Washington
- Agent Amy Ressing; Joslyn Barritt
- Main IPC: H05B31/26
- IPC: H05B31/26

Abstract:
An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.
Public/Granted literature
- US20110080093A1 Apparatus and Method for Regulating the Output of a Plasma Electron Beam Source Public/Granted day:2011-04-07
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