发明授权
- 专利标题: Plasma deposited microporous analyte detection layer
- 专利标题(中): 等离子体沉积微孔分析物检测层
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申请号: US11275277申请日: 2005-12-21
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公开(公告)号: US08293340B2公开(公告)日: 2012-10-23
- 发明人: Moses M. David , Neal A. Rakow , Dora M. Paolucci , John E. Trend
- 申请人: Moses M. David , Neal A. Rakow , Dora M. Paolucci , John E. Trend
- 申请人地址: US MN St. Paul
- 专利权人: 3M Innovative Properties Company
- 当前专利权人: 3M Innovative Properties Company
- 当前专利权人地址: US MN St. Paul
- 代理商 Karl G. Hanson
- 主分类号: H05H1/24
- IPC分类号: H05H1/24 ; G01N21/00
摘要:
Plasma deposited microporous analyte detection layers, method of forming analyte detection layers, and analyte sensors including the same are disclosed. An analyte sensor includes a substrate and a microporous amorphous random covalent network layer. The microporous amorphous random covalent network layer includes silicon, carbon, hydrogen and oxygen with a mean pore size in a range from 0.5 to 10 nanometers and an optical thickness in a range from 0.2 to 2 micrometers.
公开/授权文献
- US20070141580A1 PLASMA DEPOSITED MICROPOROUS ANALYTE DETECTION LAYER 公开/授权日:2007-06-21