Invention Grant
US08298386B2 Gas-inputting device for vacuum sputtering apparatus 失效
真空溅镀装置用气体输入装置

Gas-inputting device for vacuum sputtering apparatus
Abstract:
A gas-inputting device for a vacuum sputtering apparatus includes at least one tapered tube. Each tapered tube includes a open end, a closed end, and a conical surface. The small end is configured for introducing gas into the tapered tube. The large end opposes to the open end. Each of the at least one tapered tube tapers from the closed end to the open end. The conical surface connects the open end to the closed end. A plurality of gas holes of a same size are defined in the conical surface and equidistantly arranged along the center axis of the tapered tube from the open end to the closed end.
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