Invention Grant
- Patent Title: Gas-inputting device for vacuum sputtering apparatus
- Patent Title (中): 真空溅镀装置用气体输入装置
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Application No.: US12730257Application Date: 2010-03-24
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Publication No.: US08298386B2Publication Date: 2012-10-30
- Inventor: Chung-Pei Wang , Chia-Ying Wu
- Applicant: Chung-Pei Wang , Chia-Ying Wu
- Applicant Address: TW Tu-Cheng, New Taipei
- Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: TW Tu-Cheng, New Taipei
- Agency: Altis Law Group, Inc.
- Priority: CN200910306236 20090828
- Main IPC: C23C14/35
- IPC: C23C14/35

Abstract:
A gas-inputting device for a vacuum sputtering apparatus includes at least one tapered tube. Each tapered tube includes a open end, a closed end, and a conical surface. The small end is configured for introducing gas into the tapered tube. The large end opposes to the open end. Each of the at least one tapered tube tapers from the closed end to the open end. The conical surface connects the open end to the closed end. A plurality of gas holes of a same size are defined in the conical surface and equidistantly arranged along the center axis of the tapered tube from the open end to the closed end.
Public/Granted literature
- US20110048933A1 GAS-INPUTTING DEVICE FOR VACUUM SPUTTERING APPARATUS Public/Granted day:2011-03-03
Information query
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