Invention Grant
US08305800B2 Method for fabricating a phase-change memory cell 有权
相变存储单元的制造方法

  • Patent Title: Method for fabricating a phase-change memory cell
  • Patent Title (中): 相变存储单元的制造方法
  • Application No.: US13111963
    Application Date: 2011-05-20
  • Publication No.: US08305800B2
    Publication Date: 2012-11-06
  • Inventor: Li-Shu Tu
  • Applicant: Li-Shu Tu
  • Applicant Address: TW Kueishan, Tao-Yuan Hsien
  • Assignee: Nanya Technology Corp.
  • Current Assignee: Nanya Technology Corp.
  • Current Assignee Address: TW Kueishan, Tao-Yuan Hsien
  • Agent Winston Hsu; Scott Margo
  • Main IPC: G11C11/00
  • IPC: G11C11/00
Method for fabricating a phase-change memory cell
Abstract:
A substrate having buried address lines and a first dielectric layer is provided. A conductive electrode is formed in the first conductive layer. A top portion of the conductive electrode is exposed. A second dielectric layer is deposited on surface of the exposed top portion. The second dielectric layer defines a recess around the top portion. A third dielectric layer is deposited over the second dielectric layer. A portion of the third dielectric layer and a portion of the second dielectric layer are removed, thereby exposing a top surface of the top portion of the conductive electrode. The top portion of the conductive electrode is salicidized to form a heating stem. The remaining third dielectric layer is selectively removed from the recess. A phase-change material layer covers the heating stem and the second dielectric layer. The phase-change material layer is etched, thereby forming a phase-change storage cap.
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