Invention Grant
- Patent Title: Method for fabricating a phase-change memory cell
- Patent Title (中): 相变存储单元的制造方法
-
Application No.: US13111963Application Date: 2011-05-20
-
Publication No.: US08305800B2Publication Date: 2012-11-06
- Inventor: Li-Shu Tu
- Applicant: Li-Shu Tu
- Applicant Address: TW Kueishan, Tao-Yuan Hsien
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW Kueishan, Tao-Yuan Hsien
- Agent Winston Hsu; Scott Margo
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A substrate having buried address lines and a first dielectric layer is provided. A conductive electrode is formed in the first conductive layer. A top portion of the conductive electrode is exposed. A second dielectric layer is deposited on surface of the exposed top portion. The second dielectric layer defines a recess around the top portion. A third dielectric layer is deposited over the second dielectric layer. A portion of the third dielectric layer and a portion of the second dielectric layer are removed, thereby exposing a top surface of the top portion of the conductive electrode. The top portion of the conductive electrode is salicidized to form a heating stem. The remaining third dielectric layer is selectively removed from the recess. A phase-change material layer covers the heating stem and the second dielectric layer. The phase-change material layer is etched, thereby forming a phase-change storage cap.
Public/Granted literature
- US20110223739A1 METHOD FOR FABRICATING A PHASE-CHANGE MEMORY CELL Public/Granted day:2011-09-15
Information query