发明授权
- 专利标题: Compliant spray flux masks, systems, and methods
- 专利标题(中): 符合喷雾通量掩模,系统和方法
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申请号: US11612652申请日: 2006-12-19
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公开(公告)号: US08308047B2公开(公告)日: 2012-11-13
- 发明人: Joel Williams , Sonny J. Randall , Steven B. Roach , Sabina J. Houle
- 申请人: Joel Williams , Sonny J. Randall , Steven B. Roach , Sabina J. Houle
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwegman, Lundberg & Woessner, P.A.
- 主分类号: B23K1/20
- IPC分类号: B23K1/20 ; B05C5/02 ; B05C17/06
摘要:
A flux spray head, a mask, and an integrated circuit substrate are arranged in a flux spray station to reduce flux overspray during a spraying operation. A support element within the spray station is used to align the substrate with the mask and spray head. A portion of the mask contacts the substrate along a boundary between a region to be sprayed and a region to be masked. The flux spray head sprays the substrate while a portion of the mask is in contact with the boundary of the region to be masked. In an embodiment, the mask may comprise one or more replaceable non-stick stencil elements and associated springs to press the stencil elements against the substrate. Each stencil element may have a wall to contact the substrate along a portion of the boundary.
公开/授权文献
- US20080145541A1 COMPLIANT SPRAY FLUX MASKS, SYSTEMS, AND METHODS 公开/授权日:2008-06-19
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