Invention Grant
US08313890B2 Antireflective coating composition, antireflective coating, and patterning process
有权
抗反射涂料组合物，抗反射涂层和图案化工艺
- Patent Title: Antireflective coating composition, antireflective coating, and patterning process
- Patent Title (中): 抗反射涂料组合物，抗反射涂层和图案化工艺
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Application No.: US12636546Application Date: 2009-12-11
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Publication No.: US08313890B2Publication Date: 2012-11-20
- Inventor: Seiichiro Tachibana , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
- Applicant: Seiichiro Tachibana , Kazumi Noda , Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-316645 20081212
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/40 ; C08L31/02
Abstract:
A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.
Public/Granted literature
- US20100151381A1 ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PATTERNING PROCESS Public/Granted day:2010-06-17
Information query
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