Invention Grant
US08314003B2 Nonvolatile memory devices that use resistance materials and internal electrodes, and related methods and processing systems
有权
使用电阻材料和内部电极的非易失性存储器件,以及相关方法和处理系统
- Patent Title: Nonvolatile memory devices that use resistance materials and internal electrodes, and related methods and processing systems
- Patent Title (中): 使用电阻材料和内部电极的非易失性存储器件,以及相关方法和处理系统
-
Application No.: US13101263Application Date: 2011-05-05
-
Publication No.: US08314003B2Publication Date: 2012-11-20
- Inventor: In-Gyu Baek , Hyun-Jun Sim , Jin-Shi Zhao , Eun-Kyung Yim
- Applicant: In-Gyu Baek , Hyun-Jun Sim , Jin-Shi Zhao , Eun-Kyung Yim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR2008-0023416 20080313
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.
Public/Granted literature
Information query
IPC分类: