发明授权
US08318254B2 Metallization on a surface and in through-holes of a substrate and a catalyst used therein
有权
在其中使用的基材和催化剂的表面和通孔中的金属化
- 专利标题: Metallization on a surface and in through-holes of a substrate and a catalyst used therein
- 专利标题(中): 在其中使用的基材和催化剂的表面和通孔中的金属化
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申请号: US12289542申请日: 2008-10-30
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公开(公告)号: US08318254B2公开(公告)日: 2012-11-27
- 发明人: Yuh Sung , Ming-Der Ger , Chang-Ping Chang , Chun-Chieh Tseng , Wen-Ding Chen
- 申请人: Yuh Sung , Ming-Der Ger , Chang-Ping Chang , Chun-Chieh Tseng , Wen-Ding Chen
- 申请人地址: TW
- 专利权人: National Defense University
- 当前专利权人: National Defense University
- 当前专利权人地址: TW
- 代理机构: Bacon & Thomas, PLLC
- 优先权: TW97136550A 20080923
- 主分类号: B05D1/36
- IPC分类号: B05D1/36 ; B05D5/00
摘要:
A copolymer deposited with particles of catalytic metal is disclosed in the present invention, which is formed from an ethylenically unsaturated monomer and a hydrophilic monomer, and the catalytic metal is Au, Ag, Pd, Pt or Ru. The copolymer is hydrophilic when the temperature is lower than a specific temperature, and will become hydrophobic when the temperature is greater than the specific temperature. The present invention also discloses a method for forming a metal layer on a substrate via electroless plating, which includes contacting the substrate with an ink composition, drying the ink composition on the substrate, and contacting the dried ink composition with an electroless plating solution, wherein the ink composition contains the copolymer of the present invention in an aqueous phase. The present invention further discloses a method for forming metal conductors in through holes of a substrate.
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