发明授权
- 专利标题: Negative-working imageable elements with overcoat
- 专利标题(中): 负面工作可成像元素与大衣
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申请号: US12403458申请日: 2009-03-13
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公开(公告)号: US08318405B2公开(公告)日: 2012-11-27
- 发明人: Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
- 申请人: Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 代理商 J. Lanny Tucker
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; G03F7/09 ; G03F7/11
摘要:
Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.
公开/授权文献
- US20100233445A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 公开/授权日:2010-09-16
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