发明授权
- 专利标题: Semiconductor device and method for manufacturing of the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US12654897申请日: 2010-01-07
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公开(公告)号: US08319308B2公开(公告)日: 2012-11-27
- 发明人: Woo Chul Jeon , Jung Hee Lee , Young Hwan Park , Ki Yeol Park
- 申请人: Woo Chul Jeon , Jung Hee Lee , Young Hwan Park , Ki Yeol Park
- 申请人地址: KR Suwon
- 专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人地址: KR Suwon
- 优先权: KR10-2009-0084598 20090908
- 主分类号: H01L21/322
- IPC分类号: H01L21/322 ; H01L29/47
摘要:
The present invention provides a semiconductor device including: a base substrate; a first semiconductor layer disposed on the base substrate; first ohmic electrodes disposed on a central region of the first semiconductor layer; a second ohmic electrode having a ring shape surrounding the first ohmic electrodes, on edge regions of the first semiconductor layer; a second semiconductor layer interposed between the first ohmic electrodes and the first semiconductor layer; and a Schottky electrode part which covers the first ohmic electrodes on the central regions, and is spaced apart from the second ohmic electrode.
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