发明授权
- 专利标题： Immersion lithographic apparatus and device manufacturing method detecting residual liquid
- 专利标题（中）： 浸没光刻设备和装置制造方法检测残液
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申请号： US12289591申请日： 2008-10-30
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公开(公告)号： US08319939B2公开(公告)日： 2012-11-27
- 发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
- 申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
公开/授权文献
- US20090079949A1 Lithographic apparatus and device manufacturing method 公开/授权日：2009-03-26
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