发明授权
- 专利标题: Imprint lithography
- 专利标题(中): 印刷光刻
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申请号: US12556818申请日: 2009-09-10
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公开(公告)号: US08319968B2公开(公告)日: 2012-11-27
- 发明人: Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Catharinus De Schiffart
- 申请人: Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Catharinus De Schiffart
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G01B11/00
- IPC分类号: G01B11/00
摘要:
A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
公开/授权文献
- US20100065987A1 IMPRINT LITHOGRAPHY 公开/授权日:2010-03-18
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