Invention Grant
- Patent Title: System and method of two-stepped laser scattering defect inspection
- Patent Title (中): 两阶激光散射缺陷检测系统及方法
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Application No.: US12571791Application Date: 2009-10-01
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Publication No.: US08339593B2Publication Date: 2012-12-25
- Inventor: Eiji Kamiyama , Takehiro Tsunemori , Kazuhiro Yamamoto , Kenji Aoki
- Applicant: Eiji Kamiyama , Takehiro Tsunemori , Kazuhiro Yamamoto , Kenji Aoki
- Applicant Address: JP Tokyo
- Assignee: Sumco Corporation
- Current Assignee: Sumco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2008-259804 20081006
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A laser scattering defect inspection system includes: a stage unit that rotates a workpiece W and transports the workpiece W in one direction; a laser light source that emits a laser beam LB toward the workpiece W mounted on the stage unit; an optical deflector that scans the laser beam LB emitted from the laser light source on the workpiece W; an optical detector that detects the laser beam LB scattered from the surface of the workpiece W; a storage unit that stores defect inspection conditions for each inspection step of a manufacturing process of the workpiece W, where the conditions include the rotation speed and the moving speed of the workpiece W by the stage unit, the scan width on the workpiece W and the scan frequency by the optical deflector; and a control unit that reads the defect inspection conditions stored for each inspection step in the storage unit and controls the driving of the stage unit and the optical deflector under the conditions.
Public/Granted literature
- US20100085561A1 LASER SCATTERING DEFECT INSPECTION SYSTEM AND LASER SCATTERING DEFECT INSPECTION METHOD Public/Granted day:2010-04-08
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