- 专利标题: Self aligning non contact shadow ring process kit
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申请号: US11870285申请日: 2007-10-10
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公开(公告)号: US08342119B2公开(公告)日: 2013-01-01
- 发明人: Joseph Yudovsky , Lawrence C. Lei , Salvador Umotoy , Tom Madar , Girish Dixit , Gwo-Chuan Tzu
- 申请人: Joseph Yudovsky , Lawrence C. Lei , Salvador Umotoy , Tom Madar , Girish Dixit , Gwo-Chuan Tzu
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: C23C16/458
- IPC分类号: C23C16/458
摘要:
The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.
公开/授权文献
- US20080072823A1 SELF ALIGNING NON CONTACT SHADOW RING PROCESS KIT 公开/授权日:2008-03-27
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