Invention Grant
- Patent Title: Electrical mask inspection
- Patent Title (中): 电气面罩检查
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Application No.: US12886612Application Date: 2010-09-21
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Publication No.: US08343781B2Publication Date: 2013-01-01
- Inventor: Arvind Kumar , Anthony I-Chih Chou , Shreesh Narasimha
- Applicant: Arvind Kumar , Anthony I-Chih Chou , Shreesh Narasimha
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Ian D MacKinnon; Howard M Cohn
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66
Abstract:
An apparatus and method for electrical mask inspection is disclosed. A scan chain is formed amongst two metal layers and a via layer. One of the three layers is a functional layer under test, and the other two layers are test layers. A resistance measurement of the scan chain is used to determine if a potential defect exists within one of the vias or metal segments comprising the scan chain.
Public/Granted literature
- US20120068174A1 ELECTRICAL MASK INSPECTION Public/Granted day:2012-03-22
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