发明授权
- 专利标题： Use of beam deflection to control an electron beam wire deposition process
- 专利标题（中）： 使用光束偏转来控制电子束丝沉积过程
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申请号： US12751075申请日： 2010-03-31
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公开(公告)号： US08344281B2公开(公告)日： 2013-01-01
- 发明人: Karen M. Taminger , William H. Hofmeister , Robert A. Hafley
- 申请人： Karen M. Taminger , William H. Hofmeister , Robert A. Hafley
- 申请人地址： US DC Washington
- 专利权人： The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- 当前专利权人： The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- 当前专利权人地址： US DC Washington
- 代理商 Robin W. Edwards; Andrea Z. Warmbier; Jennifer L. Riley
- 主分类号： B23K15/00
- IPC分类号： B23K15/00
摘要：
A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.
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