Invention Grant
- Patent Title: Gas distribution ring assembly for plasma spray system
- Patent Title (中): 用于等离子喷涂系统的气体分配环组件
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Application No.: US12546226Application Date: 2009-08-24
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Publication No.: US08350181B2Publication Date: 2013-01-08
- Inventor: Joseph Garfield Albanese , Donald Joseph Baldwin , Yuk-chiu Lau , Christopher Joseph Lochner , William Patrick Rusch
- Applicant: Joseph Garfield Albanese , Donald Joseph Baldwin , Yuk-chiu Lau , Christopher Joseph Lochner , William Patrick Rusch
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Hoffman Warnick LLC
- Agent Ernest G. Cusick
- Main IPC: B23K10/00
- IPC: B23K10/00
Abstract:
A gas distribution ring assembly for a plasma spray system includes a gas distribution ring including a plurality of openings allowing a gas to pass to an inner diameter thereof. The assembly also includes a separate positioning ring axially aligned with the gas distribution ring between the gas distribution ring and an electrically charged outlet of the plasma spray system.
Public/Granted literature
- US20110042358A1 GAS DISTRIBUTION RING ASSEMBLY FOR PLASMA SPRAY SYSTEM Public/Granted day:2011-02-24
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