Invention Grant
- Patent Title: Transmission gate and semiconductor device
- Patent Title (中): 传输门和半导体器件
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Application No.: US13022338Application Date: 2011-02-07
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Publication No.: US08354873B2Publication Date: 2013-01-15
- Inventor: Takashi Ono
- Applicant: Takashi Ono
- Applicant Address: JP Chiba
- Assignee: Seiko Instruments Inc.
- Current Assignee: Seiko Instruments Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2010-026931 20100209
- Main IPC: H03K17/16
- IPC: H03K17/16 ; H03K17/687

Abstract:
Provided is a transmission gate capable of adapting to various input voltages to attain high S/N characteristics. The transmission gate includes: a PMOS transistor (11) which includes a drain to which an input voltage (Vin) is input, is turned ON when a voltage (Vin−Vs1) is input to a gate thereof, and includes a source from which the input voltage (Vin) is output as an output voltage (Vout); and an NMOS transistor (12) which has a gate length, a gate width, a gate oxide thickness, and an absolute value of a threshold voltage which are the same as those of the PMOS transistor (11), includes a drain to which the input voltage (Vin) is input, is turned ON when a voltage (Vin+Vs1) is input to a gate thereof, and includes a source from which the input voltage (Vin) is output as the output voltage (Vout).
Public/Granted literature
- US20110193615A1 TRANSMISSION GATE AND SEMICONDUCTOR DEVICE Public/Granted day:2011-08-11
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