发明授权
- 专利标题: Radio frequency power supply
- 专利标题(中): 射频电源
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申请号: US12178372申请日: 2008-07-23
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公开(公告)号: US08357874B2公开(公告)日: 2013-01-22
- 发明人: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck
- 申请人: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck
- 申请人地址: DE Freiburg
- 专利权人: Huettinger Elektronik GmbH + Co. KG
- 当前专利权人: Huettinger Elektronik GmbH + Co. KG
- 当前专利权人地址: DE Freiburg
- 代理机构: Fish & Richardson P.C.
- 优先权: WOPCT/EP2008/004651 20080611
- 主分类号: B23K10/00
- IPC分类号: B23K10/00
摘要:
A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.
公开/授权文献
- US20090026181A1 RADIO FREQUENCY POWER SUPPLY 公开/授权日:2009-01-29
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