Invention Grant
US08358179B2 Semiconductor device and method of forming directional RF coupler with IPD for additional RF signal processing 有权
半导体器件和方法,用于形成具有IPD的定向RF耦合器以用于附加的RF信号处理

Semiconductor device and method of forming directional RF coupler with IPD for additional RF signal processing
Abstract:
A semiconductor device has a substrate and RF coupler formed over the substrate. The RF coupler has a first conductive trace with a first end coupled to a first terminal of the semiconductor device, and a second conductive trace with a first end coupled to a second terminal of the semiconductor device. The first conductive trace is placed in proximity to a first portion of the second conductive trace. An integrated passive device is formed over the substrate. A second portion of the second conductive trace operates as a circuit component of the integrated passive device. The integrated passive device can be a balun or low-pass filter. The RF coupler also has a first capacitor coupled to the first terminal of the semiconductor device, and second capacitor coupled to a third terminal of the semiconductor device for higher directivity. The second conductive trace is wound to exhibit an inductive property.
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