Invention Grant
US08358179B2 Semiconductor device and method of forming directional RF coupler with IPD for additional RF signal processing
有权
半导体器件和方法,用于形成具有IPD的定向RF耦合器以用于附加的RF信号处理
- Patent Title: Semiconductor device and method of forming directional RF coupler with IPD for additional RF signal processing
- Patent Title (中): 半导体器件和方法,用于形成具有IPD的定向RF耦合器以用于附加的RF信号处理
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Application No.: US12557382Application Date: 2009-09-10
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Publication No.: US08358179B2Publication Date: 2013-01-22
- Inventor: Robert C. Frye , Kai Liu
- Applicant: Robert C. Frye , Kai Liu
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins & Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01P5/10
- IPC: H01P5/10 ; H03H7/42

Abstract:
A semiconductor device has a substrate and RF coupler formed over the substrate. The RF coupler has a first conductive trace with a first end coupled to a first terminal of the semiconductor device, and a second conductive trace with a first end coupled to a second terminal of the semiconductor device. The first conductive trace is placed in proximity to a first portion of the second conductive trace. An integrated passive device is formed over the substrate. A second portion of the second conductive trace operates as a circuit component of the integrated passive device. The integrated passive device can be a balun or low-pass filter. The RF coupler also has a first capacitor coupled to the first terminal of the semiconductor device, and second capacitor coupled to a third terminal of the semiconductor device for higher directivity. The second conductive trace is wound to exhibit an inductive property.
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