发明授权
- 专利标题： Method of determining overlay error and a device manufacturing method
- 专利标题（中）： 确定覆盖误差的方法和器件制造方法
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申请号： US12760784申请日： 2010-04-15
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公开(公告)号： US08363220B2公开(公告)日： 2013-01-29
- 发明人: Willem Marie Julia Marcel Coene , Karel Diederick Van Der Mast , Maurits Van Der Schaar
- 申请人： Willem Marie Julia Marcel Coene , Karel Diederick Van Der Mast , Maurits Van Der Schaar
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.
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