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1.发明授权Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权计量工具，包括光刻设备和计量工具的系统以及用于确定衬底参数的方法公开(公告)号：US07586598B2
公开(公告)日：2009-09-08
申请号：US11802257
申请日：2007-05-21
IPC分类号： G01N21/00
CPC分类号： G03F7/70758 , G03F7/70766
摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.
摘要翻译： 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括基架，构造和布置成保持基板的基板台，构造和布置成测量基板的参数的传感器，构造成将基板台或传感器相对于彼此移位的位移系统 第一方向，平衡块和轴承，其构造成可移动地支撑所述第一平衡块，以便在与所述第一方向相反的方向上基本上自由地平移，以抵消所述第一平衡块中的所述基板台或传感器在所述第一方向 方向。
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公开(公告)号：US07102732B2
公开(公告)日：2006-09-05
申请号：US10425369
申请日：2003-04-28
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174
摘要： Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.
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3.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06633366B2
公开(公告)日：2003-10-14
申请号：US09925723
申请日：2001-08-10
IPC分类号： G03B2754
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174
摘要： Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.
摘要翻译： 描述了用于提高电子束光刻设备中的吞吐量的各种选项。 滑块透镜与电子束的扫描运动同步移动。
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4.发明申请Metrology Tool, System Comprising a Lithographic Apparatus and a Metrology Tool, and a Method for Determining a Parameter of a Substrate 有权计量工具，包括平版印刷设备和计量工具的系统以及确定基板参数的方法公开(公告)号：US20090296081A1
公开(公告)日：2009-12-03
申请号：US12536301
申请日：2009-08-05
IPC分类号： G01N21/00
CPC分类号： G03F7/70758 , G03F7/70766
摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.
摘要翻译： 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架，底座台，传感器，排量系统，平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块，以便在与第一方向相反的方向上基本上自由地平移，以抵消基板台或传感器在第一方向上的位移。
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5.发明授权Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 有权用于产生掩模图案的平版印刷设备，方法和计算机程序产品以及使用其的设备制造方法公开(公告)号：US07500218B2
公开(公告)日：2009-03-03
申请号：US10919532
申请日：2004-08-17
IPC分类号： G06F17/50
CPC分类号： G03F7/70283 , G03F1/36 , G03F7/70291 , G03F7/70441
摘要： Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection.
摘要翻译： 灰度光学接近校正设备特征通过使用二维校正内核或两个一维校正内核卷积设备特征来添加到掩模图案中，以生成灰度OPC功能。 所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。 可以使用模拟由图案产生的空间图像，将模拟与期望图案进行比较以及调整OPC特征的迭代过程来生成用于投影的最佳图案。
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公开(公告)号：US07379579B2
公开(公告)日：2008-05-27
申请号：US10496630
申请日：2002-11-27
IPC分类号： G06K9/00
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70425
摘要： An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a beam splitter located between the programmable patterning device and the substrate table configured to divert aside a portion of the patterned beam; and an image detector configured to analyze the portion of the patterned beam.
摘要翻译： 一种成像装置，具有配置成调节波长等于或小于365nm的辐射束的照明器; 用于支撑可编程图案形成装置的支撑结构，所述可编程图案形成装置被配置为根据期望图案对所述光束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 位于所述可编程图案形成装置和所述衬底台之间的分束器，其被配置为将所述图案化束的一部分转向旁边; 以及被配置为分析图案化束的部分的图像检测器。
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公开(公告)号：US07349068B2
公开(公告)日：2008-03-25
申请号：US11013939
申请日：2004-12-17
IPC分类号： G03B27/42
CPC分类号： G03F7/70183 , G03F7/70216 , G03F7/70258 , G03F7/70291 , G03F7/70425
摘要： A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.
摘要翻译： 提供了一种系统和方法，其包括投影系统内的不同的可移动透镜，其可以放置在辐射束的路径中以改变投影系统的放大率。 通过改变投影系统的放大倍数，可以调整每像素曝光的衬底的面积，并优化系统的吞吐量。
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公开(公告)号：US08363220B2
公开(公告)日：2013-01-29
申请号：US12760784
申请日：2010-04-15
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.
摘要翻译： 一种确定重叠误差的方法，其中衍射图案的一阶的不对称性被建模为加权和谐和。 一阶谐波和高次谐波都不可忽略，两者的权重都被计算出来。 使用最小均方法，使用三个或更多个叠加图案来计算权重。
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9.发明申请Metrology Apparatus, Lithography Apparatus and Method of Measuring a Property of a Substrate 审中-公开计量仪器，平版印刷设备和测量基板特性的方法公开(公告)号：US20120092636A1
公开(公告)日：2012-04-19
申请号：US13263216
申请日：2009-04-30
申请人： Karel Diederick Van Der Mast , Nicolaas Antonius Allegondu Van Asten , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof
发明人： Karel Diederick Van Der Mast , Nicolaas Antonius Allegondu Van Asten , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof
CPC分类号： G03F7/70633 , G03F7/70616 , G03F7/70625
摘要： A metrology apparatus is configured to measure a property of a substrate. The metrology apparatus includes an illumination system configured to condition a radiation beam, an objective lens configured to project radiation onto the substrate, a detector configured to detect radiation reflected from a surface of the substrate, and an image field selecting device in the path of the reflected radiation constructed and arranged to select an area of an image field associated with the substrate. The selected area corresponds with a predetermined portion of the substrate. This arrangement may enable selection of different shapes and sizes of targets on the substrate and may enable in-die measurement of selected parameters.
摘要翻译： 测量装置被配置为测量衬底的性质。 该测量装置包括配置成调节辐射束的照明系统，配置成将辐射投影到衬底上的物镜，被配置为检测从衬底的表面反射的辐射的检测器，以及在该衬底的路径中的图像场选择装置 反射辐射构造和布置成选择与衬底相关联的图像场的区域。 所选择的区域对应于基板的预定部分。 这种布置可以使得能够在衬底上选择不同形状和尺寸的靶，并且可以实现所选参数的管芯内测量。
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公开(公告)号：US20120091629A1
公开(公告)日：2012-04-19
申请号：US13331985
申请日：2011-12-20
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychencko , Karel Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychencko , Karel Diederick Van Der Mast , Klaus Simon
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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