Invention Grant
- Patent Title: Micro shutter device and method of manufacturing the same
- Patent Title (中): 微型快门装置及其制造方法
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Application No.: US12539255Application Date: 2009-08-11
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Publication No.: US08368988B2Publication Date: 2013-02-05
- Inventor: Che-heung Kim
- Applicant: Che-heung Kim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2008-0124735 20081209
- Main IPC: G02B26/02
- IPC: G02B26/02 ; G03B9/34

Abstract:
A micro shutter device and a method of manufacturing the micro shutter device are provided. A transparent substrate is provided. A barrier is formed on the substrate to partition a unit pixel. A pattern layer is formed with a transparent material to have a transparent first pattern portion on the substrate in the unit pixel. A movable plate is arranged to face the pattern layer, has an opaque second pattern layer corresponding to a shape of the first pattern portion, and is configured to transmit light therethrough except the second pattern portion. An actuator is for moving the movable plate. Therefore, light leakage due to diffraction can be prevented, resulting in increasing contrast ratio and improving light efficiency.
Public/Granted literature
- US20100142024A1 MICRO SHUTTER DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-06-10
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