Invention Grant
- Patent Title: Vapor chamber and method for manufacturing the same
- Patent Title (中): 蒸气室及其制造方法
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Application No.: US12534880Application Date: 2009-08-04
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Publication No.: US08377214B2Publication Date: 2013-02-19
- Inventor: Sheng-Chao Zhang , Zhi-Yong Zhou , Qiao-Li Ding
- Applicant: Sheng-Chao Zhang , Zhi-Yong Zhou , Qiao-Li Ding
- Applicant Address: CN Shenzhen, Guangdong Province TW Tu-Cheng, New Taipei
- Assignee: Fu Zhun Precision Industry (Shen Zhen) Co., Ltd.,Foxconn Technology Co., Ltd.
- Current Assignee: Fu Zhun Precision Industry (Shen Zhen) Co., Ltd.,Foxconn Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen, Guangdong Province TW Tu-Cheng, New Taipei
- Agency: Altis Law Group, Inc.
- Priority: CN200910302451 20090519
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A vapor chamber includes a sealed flattened casing containing working liquid therein, a wick structure arranged on an inner face of the casing, a supporting plate received in the casing and a plurality of supporting posts. The supporting plate defines a plurality of fixing holes therein. The supporting posts are engagingly received in the fixing holes of the supporting plate. Top and bottom ends of the supporting posts engage with the wick structure to reinforce a structure of the vapor chamber.
Public/Granted literature
- US20100294200A1 VAPOR CHAMBER AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-11-25
Information query
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