Invention Grant
US08377733B2 Antireflective layer for backside illuminated image sensor and method of manufacturing same 有权
用于背面照明图像传感器的抗反射层及其制造方法

Antireflective layer for backside illuminated image sensor and method of manufacturing same
Abstract:
The present disclosure provides an image sensor device that exhibits improved quantum efficiency. For example, a backside illuminated (BSI) image sensor device is provided that includes a substrate having a front surface and a back surface; a light sensing region disposed at the front surface of the substrate; and an antireflective layer disposed over the back surface of the substrate. The antireflective layer has an index of refraction greater than or equal to about 2.2 and an extinction coefficient less than or equal to about 0.05 when measured at a wavelength less than 700 nm.
Information query
Patent Agency Ranking
0/0