Invention Grant
- Patent Title: Gate oxide breakdown-withstanding power switch structure
- Patent Title (中): 栅极氧化物击穿电源开关结构
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Application No.: US13075682Application Date: 2011-03-30
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Publication No.: US08385149B2Publication Date: 2013-02-26
- Inventor: Hao-I Yang , Ching-Te Chuang , Wei Hwang
- Applicant: Hao-I Yang , Ching-Te Chuang , Wei Hwang
- Applicant Address: TW Hsinchu
- Assignee: National Chiao Tung University
- Current Assignee: National Chiao Tung University
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW99134465A 20101008
- Main IPC: G11C5/14
- IPC: G11C5/14

Abstract:
The present invention proposes a gate oxide breakdown-withstanding power switch structure, which is connected with an SRAM and comprises a first CMOS switch and a second CMOS switch respectively having different gate-oxide thicknesses or different threshold voltages. The CMOS switch, which has a normal gate-oxide thickness or a normal threshold voltage, provides current for the SRAM to wake up the SRAM from a standby or sleep mode to an active mode. The CMOS switch, which has a thicker gate-oxide thickness or a higher threshold voltage, provides current for the SRAM to work in an active mode. The present invention prevents a power switch from gate-oxide breakdown lest noise margin, stabilization and performance of SRAM be affected.
Public/Granted literature
- US20120087196A1 GATE OXIDE BREAKDOWN-WITHSTANDING POWER SWITCH STRUCTURE Public/Granted day:2012-04-12
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