Invention Grant
- Patent Title: Support apparatus, method, and recording medium
- Patent Title (中): 支持装置,方法和记录介质
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Application No.: US12975988Application Date: 2010-12-22
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Publication No.: US08386991B2Publication Date: 2013-02-26
- Inventor: Katsuya Ogata , Hiroyuki Rokugawa
- Applicant: Katsuya Ogata , Hiroyuki Rokugawa
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Fujitsu Patent Center
- Priority: JP2009-292511 20091224
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A design support apparatus includes: a circuit-data generation unit to generate circuit data based on layout information of a semiconductor integrated circuit; and a parameter determination unit to set a first parameter relating to mechanical stress exerted on a transistor including at least one of a plurality of gates in a diffusion region, wherein the circuit-data generation unit obtains a mobility of the transistor based on the first parameter and reflects the mobility in the circuit data.
Public/Granted literature
- US20110161910A1 DESIGN SUPPORT APPARATUS, METHOD, AND RECORDING MEDIUM Public/Granted day:2011-06-30
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