Invention Grant
- Patent Title: Electron absorber layer
- Patent Title (中): 电子吸收层
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Application No.: US12828792Application Date: 2010-07-01
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Publication No.: US08389051B2Publication Date: 2013-03-05
- Inventor: Joerg Freudenberger , Oliver Stier
- Applicant: Joerg Freudenberger , Oliver Stier
- Applicant Address: DE Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Munich
- Agency: Schiff Hardin LLP
- Priority: DE102009034360 20090717
- Main IPC: B05D1/12
- IPC: B05D1/12 ; B05D5/12

Abstract:
In a method for applying an electron absorber layer to a substrate, an electron absorber layer is produced from a composite material, by coating the substrate with a metallic material, and material inclusions made from an additional material are embedded in the metallic material during coating. The metallic material contains aluminum, magnesium, cobalt, iron, chromium, titanium, nickel, copper, or an alloy or mixture thereof. The additional material contains one or more of the following substances: boron, carbon or silicon, a mixture of these elements, one or more chemical compounds made from or having at least two of these elements, or a mixture of such chemical compounds.
Public/Granted literature
- US20110014484A1 ELECTRON ABSORBER LAYER Public/Granted day:2011-01-20
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