Invention Grant
- Patent Title: Profiling solid state samples
- Patent Title (中): 分析固态样品
-
Application No.: US12861543Application Date: 2010-08-23
-
Publication No.: US08389415B2Publication Date: 2013-03-05
- Inventor: Neal R. Rueger , Mark J. Williamson , Gurtej S. Sandhu , Justin R. Arrington
- Applicant: Neal R. Rueger , Mark J. Williamson , Gurtej S. Sandhu , Justin R. Arrington
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
Methods and apparatus may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
Public/Granted literature
- US20100314354A1 PROFILING SOLID STATE SAMPLES Public/Granted day:2010-12-16
Information query
IPC分类:
