发明授权
- 专利标题： Method for patterning a photosensitive layer
- 专利标题（中）： 图案感光层的方法
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申请号： US13346917申请日： 2012-01-10
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公开(公告)号： US08394576B2公开(公告)日： 2013-03-12
- 发明人: Hsiao-Tzu Lu , Kuei Shun Chen , Tsiao-Chen Wu , Vencent Chang , George Liu
- 申请人： Hsiao-Tzu Lu , Kuei Shun Chen , Tsiao-Chen Wu , Vencent Chang , George Liu
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Haynes and Boone, LLP
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.
公开/授权文献
- US20120114872A1 METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER 公开/授权日：2012-05-10
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