Invention Grant
- Patent Title: Single-sided access device and fabrication method thereof
- Patent Title (中): 单面接入装置及其制造方法
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Application No.: US13239389Application Date: 2011-09-22
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Publication No.: US08395209B1Publication Date: 2013-03-12
- Inventor: Hsin-Jung Ho , Jeng-Ping Lin , Neng-Tai Shih , Chang-Rong Wu , Chiang-Hung Lin , Chih-Huang Wu
- Applicant: Hsin-Jung Ho , Jeng-Ping Lin , Neng-Tai Shih , Chang-Rong Wu , Chiang-Hung Lin , Chih-Huang Wu
- Applicant Address: TW Kueishan, Tao-Yuan Hsien
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW Kueishan, Tao-Yuan Hsien
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A single-sided access device includes an active fin structure comprising a source contact area and a drain contact area separated from each other by an isolation region therebetween; a trench isolation structure disposed at one side of the active fin structure, wherein the trench isolation structure intersects with the isolation region between the source contact area and the drain contact area; a sidewall gate disposed under the isolation region and on the other side of the active fin structure opposite to the trench isolation structure so that the active fin structure is sandwiched by the trench isolation structure and the sidewall gate, wherein the sidewall gate has multi-fingers that engage with the active fin structure; and a gate dielectric layer between the sidewall gate and the active fin structure.
Public/Granted literature
- US20130075812A1 SINGLE-SIDED ACCESS DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2013-03-28
Information query
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