发明授权
- 专利标题: Method and system for implementing virtual metrology in semiconductor fabrication
- 专利标题(中): 在半导体制造中实现虚拟计量的方法和系统
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申请号: US12731407申请日: 2010-03-25
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公开(公告)号: US08396583B2公开(公告)日: 2013-03-12
- 发明人: Po-Feng Tsai , Andy Tsen , Jo Fei Wang , Jong-I Mou
- 申请人: Po-Feng Tsai , Andy Tsen , Jo Fei Wang , Jong-I Mou
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
The present disclosure provides a method of fabricating a semiconductor device. The method includes collecting a plurality of manufacturing data sets from a plurality of semiconductor processes, respectively. The method includes normalizing each of the manufacturing data sets in a manner so that statistical differences among the manufacturing data sets are reduced. The method includes establishing a database that includes the normalized manufacturing data sets. The method includes normalizing the database in a manner so that the manufacturing data sets in the normalized database are statistically compatible with a selected one of the manufacturing data sets. The method includes predicting performance of a selected one of the semiconductor processes by using the normalized database. The selected semiconductor process corresponds to the selected manufacturing data set. The method includes controlling a semiconductor processing machine in response to the predicted performance.
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