发明授权
US08400733B2 Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
有权
使具有前缘屏蔽（LES）和前缘锥度（LET）的PMR写入器的过程
- 专利标题： Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
- 专利标题（中）： 使具有前缘屏蔽（LES）和前缘锥度（LET）的PMR写入器的过程
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申请号： US12954422申请日： 2010-11-24
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公开(公告)号： US08400733B2公开(公告)日： 2013-03-19
- 发明人: Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
- 申请人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
- 申请人地址： NL Amsterdam
- 专利权人： HGST Netherlands B.V.
- 当前专利权人： HGST Netherlands B.V.
- 当前专利权人地址： NL Amsterdam
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： G11B5/147
- IPC分类号： G11B5/147
摘要：
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
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