发明授权
- 专利标题： Source module, radiation source and lithographic apparatus
- 专利标题（中）： 源模块，辐射源和光刻设备
-
申请号： US12566060申请日： 2009-09-24
-
公开(公告)号： US08405055B2公开(公告)日： 2013-03-26
- 发明人: Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
- 申请人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： H05H1/42
- IPC分类号： H05H1/42
摘要：
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.
公开/授权文献
信息查询
IPC分类:
