Invention Grant
- Patent Title: Position detection apparatus, exposure apparatus, and device fabrication method
- Patent Title (中): 位置检测装置,曝光装置和装置制造方法
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Application No.: US12861282Application Date: 2010-08-23
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Publication No.: US08405818B2Publication Date: 2013-03-26
- Inventor: Tadaki Miyazaki
- Applicant: Tadaki Miyazaki
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-197236 20090827
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
The present invention provides a position detection apparatus including a sensor in which a plurality of regions where light from a mark formed on a substrate held by a stage is detected are arrayed in a first direction, a driving unit configured to drive the stage, a control unit configured to control the driving unit so as to drive the stage in a second direction perpendicular to a height direction of the substrate, so that the light guided from the mark to the sensor enters the plurality of regions while moving in the first direction, and to drive the stage in the height direction of the substrate, and a processing unit configured to process the signals from the sensor, wherein the processing unit determines a position of the substrate in the height direction, which exhibits a peak in a light intensity distribution in the first direction generated by the signals.
Public/Granted literature
- US20110051111A1 POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2011-03-03
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